Gas discharge laser with means for removing gas impurities

In an excimer laser or a molecular fluorine laser, a heating element (12) is used which is heated to temperatures in excess of 60° C., in order to remove impurities from the laser gas.

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Bibliographische Detailangaben
Hauptverfasser:	OSMANOW RUSTEM, REBHAN ULRICH
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY DEVICES USING STIMULATED EMISSION ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	In an excimer laser or a molecular fluorine laser, a heating element (12) is used which is heated to temperatures in excess of 60° C., in order to remove impurities from the laser gas.