METHOD OF REDUCING JUNCTION CAPACITANCE
A method of reducing junction capacitance. In a doped substrate or well, a super steep counter-doped implantation is performed, so as to form a super steep counter-doped region beneath the source/drain region in the substrate. As a consequence, the region near the source/drain region has a reduced d...
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| Format: | Patent |
| Sprache: | eng |
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| Zusammenfassung: | A method of reducing junction capacitance. In a doped substrate or well, a super steep counter-doped implantation is performed, so as to form a super steep counter-doped region beneath the source/drain region in the substrate. As a consequence, the region near the source/drain region has a reduced doping concentration, and the junction capacitance of the source/drain region is reduced. |
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