Measurement device with remote adjustment of electron beam stigmation by using MOSFET ohmic properties and isolation devices

A device and method are presented for adjusting Quadrupole Stigmation Magnetic Lenses of scanning electron microscope systems and for similar systems requiring high resolution particle beams. The ohmic characteristics of MOSFET devices are changed by electronic commands to calibrate particle beams, with the benefit that the calibration may be performed automatically and remotely. Automatic electronic particle beam adjustment provides flexibility by allowing a system to be universally available for different types of specimens under test requiring inspection under different aperture and acceleration voltages. Additionally, transistors provide a solution to applications which require low resistance remote control where devices such as programmable resistors or potentiometers are problematic.