6-mirror microlithography projection objective

The invention regards to a microlithography projection objective for short wavelengths, preferably

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Bibliographische Detailangaben
Hauptverfasser:	DINGER UDO, MANN HANS-JURGEN, MUHLBEYER MICHAEL
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	The invention regards to a microlithography projection objective for short wavelengths, preferably