Setting device for bending layer material more particularly paper

A setting device for bending layer material is provided, which includes a substantially stationary base frame, a running path defining a running direction and a cross-sectional running plane, and first and second guide faces for guiding the layer material. The first guide face includes a bending fac...

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1. Verfasser: MANSFELD MARKUS
Format: Patent
Sprache:eng
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Zusammenfassung:A setting device for bending layer material is provided, which includes a substantially stationary base frame, a running path defining a running direction and a cross-sectional running plane, and first and second guide faces for guiding the layer material. The first guide face includes a bending face on a bending body and the second guide face includes a deflection face. The first and second guide faces are operationally directly interconnected by the layer material when passing between the first and second guide faces. The bending body includes a bending flank directly connecting to the bending face. The bending flank and the deflection face commonly bound a gap traversed by the layer material and defining a gap width, the bending flank defining a gap plane at the gap from the deflection face up to the bending face. The layer material defines a free length which is not in contact with the deflection and bending faces. Positioning means are included for varying the gap width. The positioning means displace the deflection face relative to the bending face to a bending position in which the free length of the layer material is equal to or less than the deflection radius. Oscillations of the layer material in the free length are prevented, thus preventing tearing of the material.