Burn-in system and burn-in method

An object is to obtain a burn-in system which can speed up the burn-in not only in memory cell array portions but also in peripheral circuit and logic circuit portions. First, a wafer (3) to be evaluated is put in a constant temperature chamber (1a) and subjected to high temperature stress. The wafe...

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Bibliographische Detailangaben
Hauptverfasser: SUGIMOTO HIROMITSU, YAMAMOTO SHIGEHISA
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:An object is to obtain a burn-in system which can speed up the burn-in not only in memory cell array portions but also in peripheral circuit and logic circuit portions. First, a wafer (3) to be evaluated is put in a constant temperature chamber (1a) and subjected to high temperature stress. The wafer (3) is then put in a constant temperature chamber (1b) and subjected to low temperature stress. The applications of the temperature stresses in the constant temperature chambers (1a) and (1b) may be repeatedly performed. When given temperature stresses have been applied to the wafer (3), the wafer (3) is conveyed to an evaluation unit (5). The evaluation unit (5) then checks whether failure exists in chips (30). If the evaluation determines that a chip (30) has a failure, whether to apply repair to the failure portion is decided and repair is applied if possible.