Method for inspecting pattern defects

In a method for inspecting pattern defects, a plurality of patterns are formed over an underlying layer. The plurality of patterns are electrically isolated from each other. A part of the plurality of patterns are scanned with an electron beam to charge the plurality of patterns. An intensity of sec...

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Bibliographische Detailangaben

Hauptverfasser:	Huang, Te-Chih, Huang, Jiann Yuan, Chang, Chia-Fong, Chen, Ju-Ying, Lin, Hua-Tai, Lee, Che-Yen, Sun, Chi-Yuan
Format:	Patent
Sprache:	eng
Schlagworte:	INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING PHYSICS TESTING
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