Method for inspecting pattern defects
In a method for inspecting pattern defects, a plurality of patterns are formed over an underlying layer. The plurality of patterns are electrically isolated from each other. A part of the plurality of patterns are scanned with an electron beam to charge the plurality of patterns. An intensity of sec...
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| creator | Huang, Te-Chih Huang, Jiann Yuan Chang, Chia-Fong Chen, Ju-Ying Lin, Hua-Tai Lee, Che-Yen Sun, Chi-Yuan |
| description | In a method for inspecting pattern defects, a plurality of patterns are formed over an underlying layer. The plurality of patterns are electrically isolated from each other. A part of the plurality of patterns are scanned with an electron beam to charge the plurality of patterns. An intensity of secondary electrons emitted from the scanned part of the plurality of patterns is obtained. One or more of the plurality of patterns that show an intensity of the secondary electrons different from others of the plurality of patterns are searched. |
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The plurality of patterns are electrically isolated from each other. A part of the plurality of patterns are scanned with an electron beam to charge the plurality of patterns. An intensity of secondary electrons emitted from the scanned part of the plurality of patterns is obtained. One or more of the plurality of patterns that show an intensity of the secondary electrons different from others of the plurality of patterns are searched.</description><language>eng</language><subject>INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES ; MEASURING ; PHYSICS ; TESTING</subject><creationdate>2025</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20250114&DB=EPODOC&CC=US&NR=12196687B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20250114&DB=EPODOC&CC=US&NR=12196687B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Huang, Te-Chih</creatorcontrib><creatorcontrib>Huang, Jiann Yuan</creatorcontrib><creatorcontrib>Chang, Chia-Fong</creatorcontrib><creatorcontrib>Chen, Ju-Ying</creatorcontrib><creatorcontrib>Lin, Hua-Tai</creatorcontrib><creatorcontrib>Lee, Che-Yen</creatorcontrib><creatorcontrib>Sun, Chi-Yuan</creatorcontrib><title>Method for inspecting pattern defects</title><description>In a method for inspecting pattern defects, a plurality of patterns are formed over an underlying layer. 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| subjects | INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING PHYSICS TESTING |
| title | Method for inspecting pattern defects |
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