Chemistry reaction method and chemistry reaction device

A source material gas (31) is supplied to a catalyst (30), a first heating medium (21) is caused to flow through a first heat exchange section (22) so that a temperature of a surface of the first heat exchange section (22) on a catalyst side is maintained higher than a dew point of a reacted gas (32...

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Bibliographische Detailangaben
Hauptverfasser: Matsuda, Masato, Sato, Yuichi, Suzuta, Tetsuya, Nakasuji, Takehiro
Format: Patent
Sprache:eng
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Zusammenfassung:A source material gas (31) is supplied to a catalyst (30), a first heating medium (21) is caused to flow through a first heat exchange section (22) so that a temperature of a surface of the first heat exchange section (22) on a catalyst side is maintained higher than a dew point of a reacted gas (32), a second heating medium (51) is caused to flow through a second heat exchange section (52) so that a temperature of a surface of the second heat exchange section (52) on a space (4) side is maintained not higher than the dew point of the reacted gas (32), and a liquid obtained by condensation in the space (4) is allowed to fall down so as to be separated from the source material gas.