Rotating target for extreme ultraviolet source with liquid metal

Rotating target for extreme ultraviolet source with liquid metal

An extreme ultraviolet (EUV) light source includes a vacuum chamber with a rotating target assembly therein. The rotating target assembly has an annular groove with a distal wall relative to an axis of rotation. The distal wall includes a porous region. The rotating target assembly is rotated to for...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Shi, Rui-Fang, Bykanov, Alexander
Format: Patent
Sprache:eng
Schlagworte:
ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
X-RAY TECHNIQUE
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Beschreibung
Zusammenfassung:An extreme ultraviolet (EUV) light source includes a vacuum chamber with a rotating target assembly therein. The rotating target assembly has an annular groove with a distal wall relative to an axis of rotation. The distal wall includes a porous region. The rotating target assembly is rotated to form a target by centrifugal force with a layer of molten metal on a distal wall of an annular groove in the rotating target assembly.