Method for manufacturing display device, and display device

A display device (1) includes: a substrate (2); and a first transistor (1a) formed on the substrate (2). The first transistor (1a) includes: an oxide semiconductor layer (4) formed on the substrate (2); a gate insulating layer (5) formed on the oxide semiconductor layer (4); and a gate electrode (6)...

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Bibliographische Detailangaben
Hauptverfasser:	Kanzaki, Yohsuke, Kaneko, Seiji, Miwa, Masahiko, Sun, Yi, Saitoh, Takao, Yamanaka, Masaki
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	A display device (1) includes: a substrate (2); and a first transistor (1a) formed on the substrate (2). The first transistor (1a) includes: an oxide semiconductor layer (4) formed on the substrate (2); a gate insulating layer (5) formed on the oxide semiconductor layer (4); and a gate electrode (6) formed on the gate insulating layer (5). The oxide semiconductor layer (4) includes: a conductive region (4a) provided with conductivity; a first resistance region (4b) positioned below the gate electrode (6); and a second resistance region (4c) provided between the conductive region (4a) and the first resistance region (4b), and positioned outside the gate electrode (6). The first resistance (4b) is larger in resistance than the second resistance region (4c).