Semiconductor device

A semiconductor device and method that comprise a first dielectric layer over a encapsulant that encapsulates a via and a semiconductor die is provided. A redistribution layer is over the first dielectric layer, and a second dielectric layer is over the redistribution layer, and the second dielectri...

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Bibliographische Detailangaben
Hauptverfasser: Liao, Sih-Hao, Kuo, Hung-Jui, Yu, Chen-Hua, Chou, Meng-Wei, Kuo, Chen-Cheng, Hu, Yu-Hsiang, Lan, Jo-Lin, Liu, Zi-Jheng, Liu, Chung-Shi
Format: Patent
Sprache:eng
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Zusammenfassung:A semiconductor device and method that comprise a first dielectric layer over a encapsulant that encapsulates a via and a semiconductor die is provided. A redistribution layer is over the first dielectric layer, and a second dielectric layer is over the redistribution layer, and the second dielectric layer comprises a low-temperature polyimide material.