Charged particle beam system

An object of the invention is to acquire a high-quality image while maintaining an improvement in throughput of image acquisition (measurement (length measurement)). The present disclosure provides a charged particle beam system including a charged particle beam device and a computer system configur...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Nakamura, Yusuke, Tanimoto, Kenji, Ohashi, Takeyoshi, Abe, Yusuke
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:An object of the invention is to acquire a high-quality image while maintaining an improvement in throughput of image acquisition (measurement (length measurement)). The present disclosure provides a charged particle beam system including a charged particle beam device and a computer system configured to control the charged particle beam device. The charged particle beam device includes an objective lens, a sample stage, and a backscattered electron detector that is disposed between the objective lens and the sample stage and that adjusts a focus of a charged particle beam with which a sample is irradiated. The computer system adjusts a value of an electric field on the sample in accordance with a change in a voltage applied to the backscattered electron detector.