Method and device for wafer-level testing

The present disclosure provides a method and a system for testing semiconductor device. The method includes providing a device under test (DUT) having an input terminal and an output terminal; applying a voltage having a first voltage level to the input terminal of the DUT during a first period; app...

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Bibliographische Detailangaben
Hauptverfasser: Kuo, Yung-Liang, Lin, Wei-Hsun, He, Jun, Lin, Yu-Ting, Lu, Yinlung
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:The present disclosure provides a method and a system for testing semiconductor device. The method includes providing a device under test (DUT) having an input terminal and an output terminal; applying a voltage having a first voltage level to the input terminal of the DUT during a first period; applying a stress signal to the input terminal of the DUT during a second period subsequent to the first period; obtaining an output signal in response to the stress signal at the output terminal of the DUT; and comparing the output signal with the stress signal. The stress signal includes a plurality of sequences, each having a ramp-up stage and a ramp-down stage. The stress signal has a second voltage level and a third voltage level.