Linear showerhead for growing GaN

A linear showerhead for growing GaN, including a first gas base, a second gas base, and a third gas base. First central gas passages are disposed in the middle of the first gas base. A first gap is disposed between two adjacent first central gas passages. A first nozzle is disposed at the bottom of...

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Bibliographische Detailangaben
Hauptverfasser:	Huang, Ye, Liu, Peng, Lu, Jingquan, Wang, Jianhui
Format:	Patent
Sprache:	eng
Schlagworte:	AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUSPOLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE APPARATUS THEREFOR CHEMISTRY CRYSTAL GROWTH METALLURGY PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE REFINING BY ZONE-MELTING OF MATERIAL SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITHDEFINED STRUCTURE SINGLE-CRYSTAL-GROWTH UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL ORUNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL
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Beschreibung
Zusammenfassung:	A linear showerhead for growing GaN, including a first gas base, a second gas base, and a third gas base. First central gas passages are disposed in the middle of the first gas base. A first gap is disposed between two adjacent first central gas passages. A first nozzle is disposed at the bottom of a first central gas passage. The second gas base is disposed on the first gas base. Second central gas passages are disposed in the middle of the second gas base. A second gap is disposed between two adjacent second central gas passages. Two sides of a second central gas passage are provided with a second nozzle. The third gas base includes third central gas passages. A third central gas passage penetrates a first gap and a second gap. A third nozzle is disposed at the bottom of a third central gas passage.