Feedback loop for controlling a pulsed voltage waveform

Embodiments of this disclosure describe a feedback loop that can be used to maintain a nearly constant sheath voltage and thus creating a mono-energetic IEDF at the surface of the substrate. The system described herein consequently enables a precise control over the shape of IEDF and the profile of...

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Bibliographische Detailangaben
Hauptverfasser: Rogers, James, Plotnikov, Viacheslav, Luere, Olivier, Dorf, Leonid, Kamenetskiy, Evgeny, Dhindsa, Rajinder
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:Embodiments of this disclosure describe a feedback loop that can be used to maintain a nearly constant sheath voltage and thus creating a mono-energetic IEDF at the surface of the substrate. The system described herein consequently enables a precise control over the shape of IEDF and the profile of the features formed in the surface of the substrate.