Vacuum deposition facility and method for coating a substrate
A vacuum deposition facility for continuously depositing, on a running substrate, coatings formed from metal or metal alloy, the facility including-a vacuum chamber and a device for running the substrate through the vacuum chamber along a given path, wherein the vacuum chamber further includes:a cen...
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| creator | Marneffe, Didier Schmitz, Bruno Bonnemann, Remy Pace, Sergio Silberberg, Eric |
| description | A vacuum deposition facility for continuously depositing, on a running substrate, coatings formed from metal or metal alloy, the facility including-a vacuum chamber and a device for running the substrate through the vacuum chamber along a given path, wherein the vacuum chamber further includes:a central casing including a substrate entry and a substrate exit located on two opposite sides of the central casing and a vapor jet coater, the inner walls of the central casing being suited to be heated at a temperature above the condensation temperature of the metal or metal alloy vapors,a vapor trap in the form of an external casing located at the substrate exit of the central casing, the inner walls of the vapor trap being suited to be maintained at a temperature below the condensation temperature of the metal or metal alloy vapors. |
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| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US12054821B2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US12054821B2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US12054821B23</originalsourceid><addsrcrecordid>eNrjZLANS0wuLc1VSEktyC_OLMnMz1NIS0zOzMksqVRIzEtRyE0tychPUUjLL1JIzk8sycxLV0hUKC5NKi4pSixJ5WFgTUvMKU7lhdLcDIpuriHOHrpA0-JTiwsSk1PzUkviQ4MNjQxMTSyMDJ2MjIlRAwA0RTBo</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Vacuum deposition facility and method for coating a substrate</title><source>esp@cenet</source><creator>Marneffe, Didier ; Schmitz, Bruno ; Bonnemann, Remy ; Pace, Sergio ; Silberberg, Eric</creator><creatorcontrib>Marneffe, Didier ; Schmitz, Bruno ; Bonnemann, Remy ; Pace, Sergio ; Silberberg, Eric</creatorcontrib><description>A vacuum deposition facility for continuously depositing, on a running substrate, coatings formed from metal or metal alloy, the facility including-a vacuum chamber and a device for running the substrate through the vacuum chamber along a given path, wherein the vacuum chamber further includes:a central casing including a substrate entry and a substrate exit located on two opposite sides of the central casing and a vapor jet coater, the inner walls of the central casing being suited to be heated at a temperature above the condensation temperature of the metal or metal alloy vapors,a vapor trap in the form of an external casing located at the substrate exit of the central casing, the inner walls of the vapor trap being suited to be maintained at a temperature below the condensation temperature of the metal or metal alloy vapors.</description><language>eng</language><subject>CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2024</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240806&DB=EPODOC&CC=US&NR=12054821B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76290</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240806&DB=EPODOC&CC=US&NR=12054821B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Marneffe, Didier</creatorcontrib><creatorcontrib>Schmitz, Bruno</creatorcontrib><creatorcontrib>Bonnemann, Remy</creatorcontrib><creatorcontrib>Pace, Sergio</creatorcontrib><creatorcontrib>Silberberg, Eric</creatorcontrib><title>Vacuum deposition facility and method for coating a substrate</title><description>A vacuum deposition facility for continuously depositing, on a running substrate, coatings formed from metal or metal alloy, the facility including-a vacuum chamber and a device for running the substrate through the vacuum chamber along a given path, wherein the vacuum chamber further includes:a central casing including a substrate entry and a substrate exit located on two opposite sides of the central casing and a vapor jet coater, the inner walls of the central casing being suited to be heated at a temperature above the condensation temperature of the metal or metal alloy vapors,a vapor trap in the form of an external casing located at the substrate exit of the central casing, the inner walls of the vapor trap being suited to be maintained at a temperature below the condensation temperature of the metal or metal alloy vapors.</description><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2024</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLANS0wuLc1VSEktyC_OLMnMz1NIS0zOzMksqVRIzEtRyE0tychPUUjLL1JIzk8sycxLV0hUKC5NKi4pSixJ5WFgTUvMKU7lhdLcDIpuriHOHrpA0-JTiwsSk1PzUkviQ4MNjQxMTSyMDJ2MjIlRAwA0RTBo</recordid><startdate>20240806</startdate><enddate>20240806</enddate><creator>Marneffe, Didier</creator><creator>Schmitz, Bruno</creator><creator>Bonnemann, Remy</creator><creator>Pace, Sergio</creator><creator>Silberberg, Eric</creator><scope>EVB</scope></search><sort><creationdate>20240806</creationdate><title>Vacuum deposition facility and method for coating a substrate</title><author>Marneffe, Didier ; Schmitz, Bruno ; Bonnemann, Remy ; Pace, Sergio ; Silberberg, Eric</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US12054821B23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2024</creationdate><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>Marneffe, Didier</creatorcontrib><creatorcontrib>Schmitz, Bruno</creatorcontrib><creatorcontrib>Bonnemann, Remy</creatorcontrib><creatorcontrib>Pace, Sergio</creatorcontrib><creatorcontrib>Silberberg, Eric</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Marneffe, Didier</au><au>Schmitz, Bruno</au><au>Bonnemann, Remy</au><au>Pace, Sergio</au><au>Silberberg, Eric</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Vacuum deposition facility and method for coating a substrate</title><date>2024-08-06</date><risdate>2024</risdate><abstract>A vacuum deposition facility for continuously depositing, on a running substrate, coatings formed from metal or metal alloy, the facility including-a vacuum chamber and a device for running the substrate through the vacuum chamber along a given path, wherein the vacuum chamber further includes:a central casing including a substrate entry and a substrate exit located on two opposite sides of the central casing and a vapor jet coater, the inner walls of the central casing being suited to be heated at a temperature above the condensation temperature of the metal or metal alloy vapors,a vapor trap in the form of an external casing located at the substrate exit of the central casing, the inner walls of the vapor trap being suited to be maintained at a temperature below the condensation temperature of the metal or metal alloy vapors.</abstract><oa>free_for_read</oa></addata></record> |
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| language | eng |
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| subjects | CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
| title | Vacuum deposition facility and method for coating a substrate |
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