Lithography system and methods

A lithography exposure system includes a light source, a substrate stage, and a mask stage between the light source and the substrate stage along an optical path from the light source to the substrate stage. The lithography exposure system further comprises a reflector along the optical path. The re...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Cheng, Wen-Hao, Lee, Eng Hock
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:A lithography exposure system includes a light source, a substrate stage, and a mask stage between the light source and the substrate stage along an optical path from the light source to the substrate stage. The lithography exposure system further comprises a reflector along the optical path. The reflector comprises: a first layer having a first material and a first thickness; a second layer having the first material and a second thickness different from the first thickness; and a third layer between the first layer and the second layer, and having a second material different from the first material.