Optical semiconductor device

An optical semiconductor device includes a substrate, a semiconductor multilayer which is formed on the substrate, and includes an optical functional layer, an insulating film formed on the semiconductor multilayer, and an electrode formed on a part of the insulating film. The insulating film covers...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Nakajima, Ryosuke, Hamada, Shigetaka, Nakamura, Atsushi, Nakahara, Kouji, Yokokawa, Shoko, Washino, Ryu
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:An optical semiconductor device includes a substrate, a semiconductor multilayer which is formed on the substrate, and includes an optical functional layer, an insulating film formed on the semiconductor multilayer, and an electrode formed on a part of the insulating film. The insulating film covers the semiconductor multilayer except for a region in which the semiconductor multilayer and the electrode are electrically connected to each other. At least a part of a region of the insulating film that is overlapped with the electrode is thinner than a region of the insulating film that is not overlapped with the electrode.