Method of manufacturing devices

A method for analyzing a process, the method including obtaining a multi-dimensional probability density function representing an expected distribution of values for a plurality of process parameters; obtaining a performance function relating values of the process parameters to a performance metric...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser:	Menchtchikov, Boris, Van Der Straten, Koen Wilhelmus Cornelis Adrianus, Zou, Yi, Cheng, Yana, Tel, Wim Tjibbo, Hastings, Simon Philip Spencer, Lin, Chenxi, Slachter, Abraham, Slotboom, Daan Maurits, Genin, Maxime Philippe Frederic, Zhang, Youping, Timoshkov, Vadim Yourievich, Tabery, Cyrus Emil
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY CONTROL OR REGULATING SYSTEMS IN GENERAL CONTROLLING ELECTROGRAPHY FUNCTIONAL ELEMENTS OF SUCH SYSTEMS HOLOGRAPHY MATERIALS THEREFOR MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS REGULATING
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Beschreibung
Zusammenfassung:	A method for analyzing a process, the method including obtaining a multi-dimensional probability density function representing an expected distribution of values for a plurality of process parameters; obtaining a performance function relating values of the process parameters to a performance metric of the process; and using the performance function to map the probability density function to a performance probability function having the process parameters as arguments.