EUV light source and apparatus for EUV lithography

A metal reuse system for an extreme ultra violet (EUV) radiation source apparatus includes a first metal collector for collecting metal from vanes of the EUV radiation source apparatus, a first metal storage coupled to the first metal collector via a first conduit, a metal droplet generator coupled...

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Bibliographische Detailangaben
Hauptverfasser:	Chang, Hsiao-Lun, Chen, Li-Jui, Chang, Han-Lung, Cheng, Wei-Shin, Cheng, Po-Chung
Format:	Patent
Sprache:	eng
Schlagworte:	CONTROLLING ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY PHYSICS REGULATING SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES X-RAY TECHNIQUE
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Beschreibung
Zusammenfassung:	A metal reuse system for an extreme ultra violet (EUV) radiation source apparatus includes a first metal collector for collecting metal from vanes of the EUV radiation source apparatus, a first metal storage coupled to the first metal collector via a first conduit, a metal droplet generator coupled to the first metal storage via a second conduit, and a first metal filtration device disposed on either one of the first conduit and the second conduit.