Etching uniformity regulating device and method

An etching uniformity regulating device and method. The device comprises an inductor and a capacitor connected in parallel. One end of the etching uniformity regulating device is connected to a built-in ring located at the edge of an electrostatic chuck of an etching machine, and the other end is gr...

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Bibliographische Detailangaben
Hauptverfasser: Liu, Xiaobo, Chen, Lu, Li, Xuedong, Xu, Kaidong, Hou, Yonggang, Li, Na, Qiu, Yong, Hu, Dongdong
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:An etching uniformity regulating device and method. The device comprises an inductor and a capacitor connected in parallel. One end of the etching uniformity regulating device is connected to a built-in ring located at the edge of an electrostatic chuck of an etching machine, and the other end is grounded. The purpose of controlling the edge electric field is achieved by regulating a capacitance of the capacitor, so as to regulate the etching rate of the edge, thereby achieving etching uniformity.