Flim forming method of carbon-containing film by microwave plasma

There is provided a film forming method of forming a carbon-containing film by a microwave plasma from a microwave source, the film forming method including: a dummy step of performing a dummy process by generating plasma of a first carbon-containing gas within a processing container; a placement st...

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Bibliographische Detailangaben
Hauptverfasser: Wada, Makoto, Sugiura, Masahito, Ifuku, Ryota, Matsumoto, Takashi
Format: Patent
Sprache:eng
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Zusammenfassung:There is provided a film forming method of forming a carbon-containing film by a microwave plasma from a microwave source, the film forming method including: a dummy step of performing a dummy process by generating plasma of a first carbon-containing gas within a processing container; a placement step of placing a substrate on a stage within the processing container; and a film forming step of forming the carbon-containing film on the substrate using plasma of a second carbon-containing gas.