Patterned x-ray emitting target

The present invention is intended to provide improved patterned X-ray emitting targets as well as X-ray sources that include patterned X-ray emitting targets as well as X-ray reflectance scatterometry (XRS) systems and also including X-ray photoelectron spectroscopy (XPS) systems and X-ray fluoresce...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Schueler, Bruno W, Newcome, Bruce H, Reed, David A
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:The present invention is intended to provide improved patterned X-ray emitting targets as well as X-ray sources that include patterned X-ray emitting targets as well as X-ray reflectance scatterometry (XRS) systems and also including X-ray photoelectron spectroscopy (XPS) systems and X-ray fluorescence (XRF) systems which employ such X-ray emitting targets.