Wiping method and image forming apparatus

A wiping method for wiping a nozzle surface of a liquid discharge head includes the step of relatively moving the liquid discharge head and a wiper impregnated with a cleaning fluid. The cleaning fluid contains a lactone compound in an amount of 5% by mass or more. The wiper includes a first layer c...

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Hauptverfasser: Atake, Takumi, Izutani, Akira, Sakon, Yohta, Ohkura, Hiroko, Fujii, Ichiroh
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Sprache:eng
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creator Atake, Takumi
Izutani, Akira
Sakon, Yohta
Ohkura, Hiroko
Fujii, Ichiroh
description A wiping method for wiping a nozzle surface of a liquid discharge head includes the step of relatively moving the liquid discharge head and a wiper impregnated with a cleaning fluid. The cleaning fluid contains a lactone compound in an amount of 5% by mass or more. The wiper includes a first layer configured to contact the nozzle surface and one or more layers other than the first layer. The first layer has a thickness of t1, the one or more layers other than the first layer have a total thickness of t2, and t1 is smaller than t2. A void ratio of the first layer is smaller than a void ratio of at least one of the one or more layers other than the first layer.
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US11981141B2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US11981141B2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US11981141B23</originalsourceid><addsrcrecordid>eNrjZNAMzyzIzEtXyE0tychPUUjMS1HIzE1MT1VIyy_KBUkkFhQkFiWWlBbzMLCmJeYUp_JCaW4GRTfXEGcP3dSC_PjU4oLE5NS81JL40GBDQ0sLQ0MTQycjY2LUAAD5hijA</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Wiping method and image forming apparatus</title><source>esp@cenet</source><creator>Atake, Takumi ; Izutani, Akira ; Sakon, Yohta ; Ohkura, Hiroko ; Fujii, Ichiroh</creator><creatorcontrib>Atake, Takumi ; Izutani, Akira ; Sakon, Yohta ; Ohkura, Hiroko ; Fujii, Ichiroh</creatorcontrib><description>A wiping method for wiping a nozzle surface of a liquid discharge head includes the step of relatively moving the liquid discharge head and a wiper impregnated with a cleaning fluid. The cleaning fluid contains a lactone compound in an amount of 5% by mass or more. The wiper includes a first layer configured to contact the nozzle surface and one or more layers other than the first layer. The first layer has a thickness of t1, the one or more layers other than the first layer have a total thickness of t2, and t1 is smaller than t2. A void ratio of the first layer is smaller than a void ratio of at least one of the one or more layers other than the first layer.</description><language>eng</language><subject>CORRECTION OF TYPOGRAPHICAL ERRORS ; i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME ; LINING MACHINES ; PERFORMING OPERATIONS ; PRINTING ; SELECTIVE PRINTING MECHANISMS ; STAMPS ; TRANSPORTING ; TYPEWRITERS</subject><creationdate>2024</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20240514&amp;DB=EPODOC&amp;CC=US&amp;NR=11981141B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25564,76547</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20240514&amp;DB=EPODOC&amp;CC=US&amp;NR=11981141B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Atake, Takumi</creatorcontrib><creatorcontrib>Izutani, Akira</creatorcontrib><creatorcontrib>Sakon, Yohta</creatorcontrib><creatorcontrib>Ohkura, Hiroko</creatorcontrib><creatorcontrib>Fujii, Ichiroh</creatorcontrib><title>Wiping method and image forming apparatus</title><description>A wiping method for wiping a nozzle surface of a liquid discharge head includes the step of relatively moving the liquid discharge head and a wiper impregnated with a cleaning fluid. The cleaning fluid contains a lactone compound in an amount of 5% by mass or more. The wiper includes a first layer configured to contact the nozzle surface and one or more layers other than the first layer. The first layer has a thickness of t1, the one or more layers other than the first layer have a total thickness of t2, and t1 is smaller than t2. A void ratio of the first layer is smaller than a void ratio of at least one of the one or more layers other than the first layer.</description><subject>CORRECTION OF TYPOGRAPHICAL ERRORS</subject><subject>i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME</subject><subject>LINING MACHINES</subject><subject>PERFORMING OPERATIONS</subject><subject>PRINTING</subject><subject>SELECTIVE PRINTING MECHANISMS</subject><subject>STAMPS</subject><subject>TRANSPORTING</subject><subject>TYPEWRITERS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2024</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZNAMzyzIzEtXyE0tychPUUjMS1HIzE1MT1VIyy_KBUkkFhQkFiWWlBbzMLCmJeYUp_JCaW4GRTfXEGcP3dSC_PjU4oLE5NS81JL40GBDQ0sLQ0MTQycjY2LUAAD5hijA</recordid><startdate>20240514</startdate><enddate>20240514</enddate><creator>Atake, Takumi</creator><creator>Izutani, Akira</creator><creator>Sakon, Yohta</creator><creator>Ohkura, Hiroko</creator><creator>Fujii, Ichiroh</creator><scope>EVB</scope></search><sort><creationdate>20240514</creationdate><title>Wiping method and image forming apparatus</title><author>Atake, Takumi ; Izutani, Akira ; Sakon, Yohta ; Ohkura, Hiroko ; Fujii, Ichiroh</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US11981141B23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2024</creationdate><topic>CORRECTION OF TYPOGRAPHICAL ERRORS</topic><topic>i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME</topic><topic>LINING MACHINES</topic><topic>PERFORMING OPERATIONS</topic><topic>PRINTING</topic><topic>SELECTIVE PRINTING MECHANISMS</topic><topic>STAMPS</topic><topic>TRANSPORTING</topic><topic>TYPEWRITERS</topic><toplevel>online_resources</toplevel><creatorcontrib>Atake, Takumi</creatorcontrib><creatorcontrib>Izutani, Akira</creatorcontrib><creatorcontrib>Sakon, Yohta</creatorcontrib><creatorcontrib>Ohkura, Hiroko</creatorcontrib><creatorcontrib>Fujii, Ichiroh</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Atake, Takumi</au><au>Izutani, Akira</au><au>Sakon, Yohta</au><au>Ohkura, Hiroko</au><au>Fujii, Ichiroh</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Wiping method and image forming apparatus</title><date>2024-05-14</date><risdate>2024</risdate><abstract>A wiping method for wiping a nozzle surface of a liquid discharge head includes the step of relatively moving the liquid discharge head and a wiper impregnated with a cleaning fluid. The cleaning fluid contains a lactone compound in an amount of 5% by mass or more. The wiper includes a first layer configured to contact the nozzle surface and one or more layers other than the first layer. The first layer has a thickness of t1, the one or more layers other than the first layer have a total thickness of t2, and t1 is smaller than t2. A void ratio of the first layer is smaller than a void ratio of at least one of the one or more layers other than the first layer.</abstract><oa>free_for_read</oa></addata></record>
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subjects CORRECTION OF TYPOGRAPHICAL ERRORS
i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME
LINING MACHINES
PERFORMING OPERATIONS
PRINTING
SELECTIVE PRINTING MECHANISMS
STAMPS
TRANSPORTING
TYPEWRITERS
title Wiping method and image forming apparatus
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-28T20%3A31%3A37IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=Atake,%20Takumi&rft.date=2024-05-14&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS11981141B2%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true