Wiping method and image forming apparatus

A wiping method for wiping a nozzle surface of a liquid discharge head includes the step of relatively moving the liquid discharge head and a wiper impregnated with a cleaning fluid. The cleaning fluid contains a lactone compound in an amount of 5% by mass or more. The wiper includes a first layer c...

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Bibliographische Detailangaben
Hauptverfasser:	Atake, Takumi, Izutani, Akira, Sakon, Yohta, Ohkura, Hiroko, Fujii, Ichiroh
Format:	Patent
Sprache:	eng
Schlagworte:	CORRECTION OF TYPOGRAPHICAL ERRORS i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME LINING MACHINES PERFORMING OPERATIONS PRINTING SELECTIVE PRINTING MECHANISMS STAMPS TRANSPORTING TYPEWRITERS
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Beschreibung
Zusammenfassung:	A wiping method for wiping a nozzle surface of a liquid discharge head includes the step of relatively moving the liquid discharge head and a wiper impregnated with a cleaning fluid. The cleaning fluid contains a lactone compound in an amount of 5% by mass or more. The wiper includes a first layer configured to contact the nozzle surface and one or more layers other than the first layer. The first layer has a thickness of t1, the one or more layers other than the first layer have a total thickness of t2, and t1 is smaller than t2. A void ratio of the first layer is smaller than a void ratio of at least one of the one or more layers other than the first layer.