Mask inspection apparatus and mask inspection method using the same

A mask inspection method including the steps of obtaining an image of a mask including a first region having a plurality of first openings, and a second region having a plurality of second openings, sectioning the image into a first partial image corresponding to the first region and a second partia...

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Bibliographische Detailangaben
Hauptverfasser:	Kim, TaeHyun, Woo, Jimin, Kwon, Mihye, Song, Ilha, Kim, BongSuk, Hwang, Sangdon
Format:	Patent
Sprache:	eng
Schlagworte:	CALCULATING COMPUTING COUNTING ELECTRICITY IMAGE DATA PROCESSING OR GENERATION, IN GENERAL INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING PHYSICS TESTING
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Beschreibung
Zusammenfassung:	A mask inspection method including the steps of obtaining an image of a mask including a first region having a plurality of first openings, and a second region having a plurality of second openings, sectioning the image into a first partial image corresponding to the first region and a second partial image corresponding to the second region, respectively, inspecting the first region of the mask based on the first partial image, and inspecting the second region of the mask based on the second partial image.