Systems and methods for fabrication of superconducting integrated circuits

Various techniques and apparatus permit fabrication of superconductive circuits. A superconducting integrated circuit comprising a superconducting stud via, a kinetic inductor, and a capacitor may be formed. Forming a superconducting stud via in a superconducting integrated circuit may include maski...

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Bibliographische Detailangaben
Hauptverfasser: Bunyk, Paul I, Ladizinsky, Nicolas C, Huang, Shuiyuan, Stadtler, Douglas P, Harris, Richard G, Enderud, Colin C, Whittaker, Jed D, Ladizinsky, Eric G, Oh, Byong H, Altomare, Fabio, Swenson, Loren J, Sterpka, Edward G, Yao, Jason J
Format: Patent
Sprache:eng
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Zusammenfassung:Various techniques and apparatus permit fabrication of superconductive circuits. A superconducting integrated circuit comprising a superconducting stud via, a kinetic inductor, and a capacitor may be formed. Forming a superconducting stud via in a superconducting integrated circuit may include masking with a hard mask and masking with a soft mask. Forming a superconducting stud via in a superconducting integrated circuit may include depositing a dielectric etch stop layer. Interlayer misalignment in the fabrication of a superconducting integrated circuit may be measured by an electrical vernier. Interlayer misalignment in the fabrication of a superconducting integrated circuit may be measured by a chain of electrical verniers and a Wheatstone bridge. A superconducting integrated circuit with three or more metal layers may include an enclosed, matched, on-chip transmission line. A metal wiring layer in a superconducting integrated circuit may be encapsulated.