Carbon-doped silicon dioxide glass and methods of manufacturing thereof

A silica-based substrate includes a glass phase and a dispersed phase having carbon, such that the silica-based substrate has a thickness of at least 10 gm. Also disclosed is a method of forming a silica-based substrate, the method including contacting a porous silica soot preform with an organic so...

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Bibliographische Detailangaben
Hauptverfasser: LeBlond, Nicolas, Zhang, Haitao, Li, Ming-Jun, Gu, Yunfeng, Stone, Jeffery Scott
Format: Patent
Sprache:eng
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Zusammenfassung:A silica-based substrate includes a glass phase and a dispersed phase having carbon, such that the silica-based substrate has a thickness of at least 10 gm. Also disclosed is a method of forming a silica-based substrate, the method including contacting a porous silica soot preform with an organic solution having at least one hydrocarbon precursor to form a doped silica soot preform and heating the doped silica soot preform in an inert atmosphere to form the silica-based substrate.