Controlling apparatus for controlling operation of substrate processing apparatus

A controlling apparatus for controlling operation of a substrate processing apparatus includes a first CTC, and a second CTC. When the first CTC stops operating, the second CTC is preset to control each module in the substrate processing apparatus in place of the first CTC. As the first CTC and the...

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Bibliographische Detailangaben
1. Verfasser:	Seo, Sang Bo
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CONTROL OR REGULATING SYSTEMS IN GENERAL CONTROLLING ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY FUNCTIONAL ELEMENTS OF SUCH SYSTEMS MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS PHYSICS REGULATING SEMICONDUCTOR DEVICES
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Zusammenfassung:	A controlling apparatus for controlling operation of a substrate processing apparatus includes a first CTC, and a second CTC. When the first CTC stops operating, the second CTC is preset to control each module in the substrate processing apparatus in place of the first CTC. As the first CTC and the second CTC are dualized to provide the controlling apparatus, even when one of the CTCs stops operating, another dualized CTC is used to control the substrate processing apparatus, so that operation-stop of the substrate processing system is prevented and entire process efficiency is increased.