Salt, acid generator, resist composition and method for producing resist pattern

A salt represented by formula (I), an acid generator and a resist composition:wherein R1, R2 and R3 each represent a hydroxy group, -O-R10, -O-CO-O-R10, -O-L1-CO-O-R10; R4, R5, R6, R7, R8 and R9 each represent a halogen atom, a hydroxy group, etc.; L1 represents an alkanediyl group; R10 represents a...

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Hauptverfasser:	Komuro, Katsuhiro, Ichikawa, Koji
Format:	Patent
Sprache:	eng
Schlagworte:	ACYCLIC OR CARBOCYCLIC COMPOUNDS APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY ELECTROGRAPHY HETEROCYCLIC COMPOUNDS HOLOGRAPHY MATERIALS THEREFOR METALLURGY ORGANIC CHEMISTRY ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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creator	Komuro, Katsuhiro Ichikawa, Koji
description	A salt represented by formula (I), an acid generator and a resist composition:wherein R1, R2 and R3 each represent a hydroxy group, -O-R10, -O-CO-O-R10, -O-L1-CO-O-R10; R4, R5, R6, R7, R8 and R9 each represent a halogen atom, a hydroxy group, etc.; L1 represents an alkanediyl group; R10 represents an acid-labile group; X1, X2 and X3 each represent an oxygen atom or a sulfur atom; m1 and m7 represent an integer of 0 to 5, m2 to m6 and m8, m9 represent an integer of 0 to 4, in which 0≤m1+m7≤5, 0≤m2+m8≤4, 0≤m3+m9≤4, and at least one of m1, m2 and m3 represents an integer of 1 or more; X4 represents a single bond, -CH2-, -O-, -S-, etc.; and AI− represents an organic anion.
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R4, R5, R6, R7, R8 and R9 each represent a halogen atom, a hydroxy group, etc.; L1 represents an alkanediyl group; R10 represents an acid-labile group; X1, X2 and X3 each represent an oxygen atom or a sulfur atom; m1 and m7 represent an integer of 0 to 5, m2 to m6 and m8, m9 represent an integer of 0 to 4, in which 0≤m1+m7≤5, 0≤m2+m8≤4, 0≤m3+m9≤4, and at least one of m1, m2 and m3 represents an integer of 1 or more; X4 represents a single bond, -CH2-, -O-, -S-, etc.; and AI− represents an organic anion.</description><language>eng</language><subject>ACYCLIC OR CARBOCYCLIC COMPOUNDS ; APPARATUS SPECIALLY ADAPTED THEREFOR ; CHEMISTRY ; CINEMATOGRAPHY ; ELECTROGRAPHY ; HETEROCYCLIC COMPOUNDS ; HOLOGRAPHY ; MATERIALS THEREFOR ; METALLURGY ; ORGANIC CHEMISTRY ; ORIGINALS THEREFOR ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS</subject><creationdate>2024</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240213&DB=EPODOC&CC=US&NR=11899363B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,309,781,886,25566,76549</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20240213&DB=EPODOC&CC=US&NR=11899363B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Komuro, Katsuhiro</creatorcontrib><creatorcontrib>Ichikawa, Koji</creatorcontrib><title>Salt, acid generator, resist composition and method for producing resist pattern</title><description>A salt represented by formula (I), an acid generator and a resist composition:wherein R1, R2 and R3 each represent a hydroxy group, -O-R10, -O-CO-O-R10, -O-L1-CO-O-R10; R4, R5, R6, R7, R8 and R9 each represent a halogen atom, a hydroxy group, etc.; L1 represents an alkanediyl group; R10 represents an acid-labile group; X1, X2 and X3 each represent an oxygen atom or a sulfur atom; m1 and m7 represent an integer of 0 to 5, m2 to m6 and m8, m9 represent an integer of 0 to 4, in which 0≤m1+m7≤5, 0≤m2+m8≤4, 0≤m3+m9≤4, and at least one of m1, m2 and m3 represents an integer of 1 or more; X4 represents a single bond, -CH2-, -O-, -S-, etc.; and AI− represents an organic anion.</description><subject>ACYCLIC OR CARBOCYCLIC COMPOUNDS</subject><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CHEMISTRY</subject><subject>CINEMATOGRAPHY</subject><subject>ELECTROGRAPHY</subject><subject>HETEROCYCLIC COMPOUNDS</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>METALLURGY</subject><subject>ORGANIC CHEMISTRY</subject><subject>ORIGINALS THEREFOR</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2024</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNzbEKwkAMgOFbHER9h7jXoR6IXRXFUajOJdyl7UF7Cbn4_jro7vQvH_xLd29xsgowpAgDZVI01gqUSioGgWfhkixxBswRZrKRI_SsIMrxFVIeflbQjDSv3aLHqdDm25XbXi-P821Hwh0VwfC5WPds6_rYNP7gT3v_j3kDlH83qw</recordid><startdate>20240213</startdate><enddate>20240213</enddate><creator>Komuro, Katsuhiro</creator><creator>Ichikawa, Koji</creator><scope>EVB</scope></search><sort><creationdate>20240213</creationdate><title>Salt, acid generator, resist composition and method for producing resist pattern</title><author>Komuro, Katsuhiro ; 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subjects	ACYCLIC OR CARBOCYCLIC COMPOUNDS APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY ELECTROGRAPHY HETEROCYCLIC COMPOUNDS HOLOGRAPHY MATERIALS THEREFOR METALLURGY ORGANIC CHEMISTRY ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
title	Salt, acid generator, resist composition and method for producing resist pattern
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