Salt, acid generator, resist composition and method for producing resist pattern

A salt represented by formula (I), an acid generator and a resist composition:wherein R1, R2 and R3 each represent a hydroxy group, -O-R10, -O-CO-O-R10, -O-L1-CO-O-R10; R4, R5, R6, R7, R8 and R9 each represent a halogen atom, a hydroxy group, etc.; L1 represents an alkanediyl group; R10 represents a...

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Bibliographische Detailangaben
Hauptverfasser:	Komuro, Katsuhiro, Ichikawa, Koji
Format:	Patent
Sprache:	eng
Schlagworte:	ACYCLIC OR CARBOCYCLIC COMPOUNDS APPARATUS SPECIALLY ADAPTED THEREFOR CHEMISTRY CINEMATOGRAPHY ELECTROGRAPHY HETEROCYCLIC COMPOUNDS HOLOGRAPHY MATERIALS THEREFOR METALLURGY ORGANIC CHEMISTRY ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	A salt represented by formula (I), an acid generator and a resist composition:wherein R1, R2 and R3 each represent a hydroxy group, -O-R10, -O-CO-O-R10, -O-L1-CO-O-R10; R4, R5, R6, R7, R8 and R9 each represent a halogen atom, a hydroxy group, etc.; L1 represents an alkanediyl group; R10 represents an acid-labile group; X1, X2 and X3 each represent an oxygen atom or a sulfur atom; m1 and m7 represent an integer of 0 to 5, m2 to m6 and m8, m9 represent an integer of 0 to 4, in which 0≤m1+m7≤5, 0≤m2+m8≤4, 0≤m3+m9≤4, and at least one of m1, m2 and m3 represents an integer of 1 or more; X4 represents a single bond, -CH2-, -O-, -S-, etc.; and AI− represents an organic anion.