Method and system of reducing charged particle beam write time

Method and system of reducing charged particle beam write time

A method for exposing a pattern in an area on a surface using a charged particle beam lithography is disclosed and includes inputting an original set of exposure information for the area. The area comprises a plurality of pixels, and the original set of exposure information comprises dosages for the...

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Hauptverfasser: Pearman, Ryan, Guthrie, William E, Shirali, Nagesh, Fujimura, Akira, Shendre, Abhishek, Zable, Harold Robert
Format: Patent
Sprache:eng
Schlagworte:
CONTROL OR REGULATING SYSTEMS IN GENERAL
CONTROLLING
FUNCTIONAL ELEMENTS OF SUCH SYSTEMS
MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS
PHYSICS
REGULATING
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creator Pearman, Ryan
Guthrie, William E
Shirali, Nagesh
Fujimura, Akira
Shendre, Abhishek
Zable, Harold Robert
description A method for exposing a pattern in an area on a surface using a charged particle beam lithography is disclosed and includes inputting an original set of exposure information for the area. The area comprises a plurality of pixels, and the original set of exposure information comprises dosages for the plurality of pixels in the area. A backscatter is calculated for a sub area of the area based on the original set of exposure information including the dosages for the plurality of pixels in the area. An increase in dosage for at least one pixel in a plurality of pixels in the sub area is determined, in a location where the backscatter of the sub area is below a pre-determined threshold, thereby increasing the backscatter of the sub area.
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US11886166B2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US11886166B2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US11886166B23</originalsourceid><addsrcrecordid>eNrjZLDzTS3JyE9RSMxLUSiuLC5JzVXIT1MoSk0pTc7MS1dIzkgsSk9NUShILCrJTM5JVUhKTcxVKC_KLElVKMnMTeVhYE1LzClO5YXS3AyKbq4hzh66qQX58anFBYnJqXmpJfGhwYaGFhZmhmZmTkbGxKgBADaCMHM</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Method and system of reducing charged particle beam write time</title><source>esp@cenet</source><creator>Pearman, Ryan ; Guthrie, William E ; Shirali, Nagesh ; Fujimura, Akira ; Shendre, Abhishek ; Zable, Harold Robert</creator><creatorcontrib>Pearman, Ryan ; Guthrie, William E ; Shirali, Nagesh ; Fujimura, Akira ; Shendre, Abhishek ; Zable, Harold Robert</creatorcontrib><description>A method for exposing a pattern in an area on a surface using a charged particle beam lithography is disclosed and includes inputting an original set of exposure information for the area. The area comprises a plurality of pixels, and the original set of exposure information comprises dosages for the plurality of pixels in the area. A backscatter is calculated for a sub area of the area based on the original set of exposure information including the dosages for the plurality of pixels in the area. An increase in dosage for at least one pixel in a plurality of pixels in the sub area is determined, in a location where the backscatter of the sub area is below a pre-determined threshold, thereby increasing the backscatter of the sub area.</description><language>eng</language><subject>CONTROL OR REGULATING SYSTEMS IN GENERAL ; CONTROLLING ; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS ; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS ; PHYSICS ; REGULATING</subject><creationdate>2024</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20240130&amp;DB=EPODOC&amp;CC=US&amp;NR=11886166B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20240130&amp;DB=EPODOC&amp;CC=US&amp;NR=11886166B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Pearman, Ryan</creatorcontrib><creatorcontrib>Guthrie, William E</creatorcontrib><creatorcontrib>Shirali, Nagesh</creatorcontrib><creatorcontrib>Fujimura, Akira</creatorcontrib><creatorcontrib>Shendre, Abhishek</creatorcontrib><creatorcontrib>Zable, Harold Robert</creatorcontrib><title>Method and system of reducing charged particle beam write time</title><description>A method for exposing a pattern in an area on a surface using a charged particle beam lithography is disclosed and includes inputting an original set of exposure information for the area. The area comprises a plurality of pixels, and the original set of exposure information comprises dosages for the plurality of pixels in the area. A backscatter is calculated for a sub area of the area based on the original set of exposure information including the dosages for the plurality of pixels in the area. An increase in dosage for at least one pixel in a plurality of pixels in the sub area is determined, in a location where the backscatter of the sub area is below a pre-determined threshold, thereby increasing the backscatter of the sub area.</description><subject>CONTROL OR REGULATING SYSTEMS IN GENERAL</subject><subject>CONTROLLING</subject><subject>FUNCTIONAL ELEMENTS OF SUCH SYSTEMS</subject><subject>MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS</subject><subject>PHYSICS</subject><subject>REGULATING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2024</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLDzTS3JyE9RSMxLUSiuLC5JzVXIT1MoSk0pTc7MS1dIzkgsSk9NUShILCrJTM5JVUhKTcxVKC_KLElVKMnMTeVhYE1LzClO5YXS3AyKbq4hzh66qQX58anFBYnJqXmpJfGhwYaGFhZmhmZmTkbGxKgBADaCMHM</recordid><startdate>20240130</startdate><enddate>20240130</enddate><creator>Pearman, Ryan</creator><creator>Guthrie, William E</creator><creator>Shirali, Nagesh</creator><creator>Fujimura, Akira</creator><creator>Shendre, Abhishek</creator><creator>Zable, Harold Robert</creator><scope>EVB</scope></search><sort><creationdate>20240130</creationdate><title>Method and system of reducing charged particle beam write time</title><author>Pearman, Ryan ; Guthrie, William E ; Shirali, Nagesh ; Fujimura, Akira ; Shendre, Abhishek ; Zable, Harold Robert</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US11886166B23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2024</creationdate><topic>CONTROL OR REGULATING SYSTEMS IN GENERAL</topic><topic>CONTROLLING</topic><topic>FUNCTIONAL ELEMENTS OF SUCH SYSTEMS</topic><topic>MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS</topic><topic>PHYSICS</topic><topic>REGULATING</topic><toplevel>online_resources</toplevel><creatorcontrib>Pearman, Ryan</creatorcontrib><creatorcontrib>Guthrie, William E</creatorcontrib><creatorcontrib>Shirali, Nagesh</creatorcontrib><creatorcontrib>Fujimura, Akira</creatorcontrib><creatorcontrib>Shendre, Abhishek</creatorcontrib><creatorcontrib>Zable, Harold Robert</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Pearman, Ryan</au><au>Guthrie, William E</au><au>Shirali, Nagesh</au><au>Fujimura, Akira</au><au>Shendre, Abhishek</au><au>Zable, Harold Robert</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Method and system of reducing charged particle beam write time</title><date>2024-01-30</date><risdate>2024</risdate><abstract>A method for exposing a pattern in an area on a surface using a charged particle beam lithography is disclosed and includes inputting an original set of exposure information for the area. The area comprises a plurality of pixels, and the original set of exposure information comprises dosages for the plurality of pixels in the area. A backscatter is calculated for a sub area of the area based on the original set of exposure information including the dosages for the plurality of pixels in the area. An increase in dosage for at least one pixel in a plurality of pixels in the sub area is determined, in a location where the backscatter of the sub area is below a pre-determined threshold, thereby increasing the backscatter of the sub area.</abstract><oa>free_for_read</oa></addata></record>
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subjects CONTROL OR REGULATING SYSTEMS IN GENERAL
CONTROLLING
FUNCTIONAL ELEMENTS OF SUCH SYSTEMS
MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS
PHYSICS
REGULATING
title Method and system of reducing charged particle beam write time
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-04T19%3A11%3A13IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=Pearman,%20Ryan&rft.date=2024-01-30&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EUS11886166B2%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true