Optical emission spectroscopy control of gas flow in processing chambers

A system may be configured to monitor an amount of a gas species in a processing chamber using Optical Emission Spectrometry. The gas measurement may be provided as feedback to a control process that generates a target setpoint for a gas flow controller into the process chamber. This real-time proce...

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Bibliographische Detailangaben
Hauptverfasser:	Kiely, Paul G, DiGiacomo, Philip, Miller, Keith A, Agrawal, Rajat, Garg, Sunil Kumar
Format:	Patent
Sprache:	eng
Schlagworte:	CONTROL OR REGULATING SYSTEMS IN GENERAL CONTROLLING FUNCTIONAL ELEMENTS OF SUCH SYSTEMS INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS PHYSICS REGULATING SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES TESTING
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Beschreibung
Zusammenfassung:	A system may be configured to monitor an amount of a gas species in a processing chamber using Optical Emission Spectrometry. The gas measurement may be provided as feedback to a control process that generates a target setpoint for a gas flow controller into the process chamber. This real-time process may increase/decrease the flow rate of the gas in order to maintain a process deposition mode within a transition region between primarily metallic deposition and primarily compound deposition.