Semiconductor device including superlattice with oxygen and carbon monolayers

A semiconductor device may include a semiconductor layer and a superlattice adjacent the semiconductor layer. The superlattice may include a plurality of stacked groups of layers, with each group of layers comprising a plurality of stacked base semiconductor monolayers defining a base semiconductor...

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Bibliographische Detailangaben
Hauptverfasser: Weeks, Keith Doran, Mears, Robert J, Stephenson, Robert John, Hytha, Marek, Takeuchi, Hideki, Cody, Nyles Wynn
Format: Patent
Sprache:eng
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Zusammenfassung:A semiconductor device may include a semiconductor layer and a superlattice adjacent the semiconductor layer. The superlattice may include a plurality of stacked groups of layers, with each group of layers comprising a plurality of stacked base semiconductor monolayers defining a base semiconductor portion, and at least one non-semiconductor monolayer constrained within a crystal lattice of adjacent base semiconductor portions. The at least one non-semiconductor monolayer in a first group of layers of the superlattice may comprise oxygen and be devoid of carbon, and the at least one non-semiconductor monolayer in a second group of layers of the superlattice may comprise carbon.