Reducing substrate surface scratching using machine learning

Reducing substrate surface scratching using machine learning

Process recipe data associated a process to be performed for a substrate at a process chamber is provided as input to a trained machine learning model. A set of process recipe settings for the process that minimizes scratching on one or more surfaces of the substrate is determined based on one or mo...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Balaraman, Karthikeyan, Shah, Kartik B, Ramanathan, Karthik, Jackson, Michael Sterling, Hu, Weize, Xu, Wenjing, Radhakrishnan, Satish, Allen, Adolph Miller, Chong, Xinyuan, Sahu, Mitrabhanu, Chen, Feng
Format: Patent
Sprache:eng
Schlagworte:
CONTROL OR REGULATING SYSTEMS IN GENERAL
CONTROLLING
FUNCTIONAL ELEMENTS OF SUCH SYSTEMS
MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS ORELEMENTS
PHYSICS
REGULATING
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Beschreibung
Zusammenfassung:Process recipe data associated a process to be performed for a substrate at a process chamber is provided as input to a trained machine learning model. A set of process recipe settings for the process that minimizes scratching on one or more surfaces of the substrate is determined based on one or more outputs of the machine learning model. The process is performed for the substrate at the process chamber in accordance with the determined set of process recipe settings.