Salt, acid generator, resist composition and method for producing resist pattern

Salt, acid generator, resist composition and method for producing resist pattern

Disclosed are a salt represented by formula (I), an acid generator, and a resist composition including the same:wherein R1, R2 and R3 each represent a hydroxy group, *-O-R10, *-O-CO-O-R10, etc.; L10 represents an alkanediyl group; R10 represents an acid-labile group; R4, R5, R6, R7, R8 and R9 each r...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Komuro, Katsuhiro, Ichikawa, Koji
Format: Patent
Sprache:eng
Schlagworte:
ACYCLIC OR CARBOCYCLIC COMPOUNDS
APPARATUS SPECIALLY ADAPTED THEREFOR
CHEMISTRY
CINEMATOGRAPHY
ELECTROGRAPHY
HOLOGRAPHY
MATERIALS THEREFOR
METALLURGY
ORGANIC CHEMISTRY
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
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Beschreibung
Zusammenfassung:Disclosed are a salt represented by formula (I), an acid generator, and a resist composition including the same:wherein R1, R2 and R3 each represent a hydroxy group, *-O-R10, *-O-CO-O-R10, etc.; L10 represents an alkanediyl group; R10 represents an acid-labile group; R4, R5, R6, R7, R8 and R9 each represent a halogen atom, a haloalkyl group or a hydrocarbon group; A1, A2 and A3 each represent a hydrocarbon group which may have a substituent, and -CH2- included in the hydrocarbon group may be replaced by -O-, -CO-, -S- or -SO2-; m1 represents an integer of 1 to 5, m2, m3, m8 and m9 represent an integer of 0 to 5, m4 to m7 represent an integer of 0 to 4, 1≤m1+m7≤5, 0≤m2+m8≤5, 0≤m3+m9≤5; and AI− represents an organic anion.