Liquid discharge apparatus

There is provided a liquid discharge apparatus including: a head including a nozzle surface; a wiper including a blade and a blade holder; a posture changer configured to change a posture of the blade to a first posture in which the blade makes contact with the nozzle surface and to a second posture...

Ausführliche Beschreibung

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Bibliographische Detailangaben
1. Verfasser: Ogawa, Mikio
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:There is provided a liquid discharge apparatus including: a head including a nozzle surface; a wiper including a blade and a blade holder; a posture changer configured to change a posture of the blade to a first posture in which the blade makes contact with the nozzle surface and to a second posture which is different from the first posture; and a cleaner including a cleaning surface intersecting the nozzle surface. The blade in the first posture is configured to move in a first sliding direction relatively with respect to the head in a state in which the blade makes contact with the nozzle surface. The blade in the second posture is configured to move in a second sliding direction intersecting the first sliding direction relatively with respect to the cleaner in a state in which the blade makes contact with the cleaning surface.