Method of forming backside illuminated image sensor device with shielding layer

A backside illuminated image sensor device with a shielding layer and a manufacturing method thereof are provided. In the backside illuminated image senor device, a patterned conductive shielding layer is formed on a dielectric layer on a backside surface of a semiconductor substrate and surrounding...

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Bibliographische Detailangaben
Hauptverfasser: Chang, Su-Hua, Jeng, Chi-Cherng, Huang, Zen-Fong, Wei, Chia-Yu, Chien, Volume
Format: Patent
Sprache:eng
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Zusammenfassung:A backside illuminated image sensor device with a shielding layer and a manufacturing method thereof are provided. In the backside illuminated image senor device, a patterned conductive shielding layer is formed on a dielectric layer on a backside surface of a semiconductor substrate and surrounding a pixel array on a front side surface of the semiconductor substrate.