Laser etching apparatus and laser etching method using the same

A laser etching apparatus includes a light source to emit a first laser beam having a first energy profile; and a scanner to radiate a second laser beam upon an object along a circular path, the second laser beam having a second energy profile different from the first energy profile.

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Bibliographische Detailangaben
Hauptverfasser: Bae, Yoongyeong, Han, Gyoowan, Oh, Taekil, Ko, Yeonghwan, Ahn, Jooseob
Format: Patent
Sprache:eng
Schlagworte:
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Beschreibung
Zusammenfassung:A laser etching apparatus includes a light source to emit a first laser beam having a first energy profile; and a scanner to radiate a second laser beam upon an object along a circular path, the second laser beam having a second energy profile different from the first energy profile.