Semiconductor device having buried logic conductor type of complementary field effect transistor, method of forming same

A semiconductor device includes a buried communication (com) conductor (BC) CFET including: first and second active regions arranged in a stack according to CFET-type configuration; a first layer of metallization (M_1st layer) over the stack which includes first conductors configured for data or con...

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Bibliographische Detailangaben
Hauptverfasser: Wu, Guo-Huei, Chen, Chih-Liang, Tien, Li-Chun, Wang, Pochun
Format: Patent
Sprache:eng
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Zusammenfassung:A semiconductor device includes a buried communication (com) conductor (BC) CFET including: first and second active regions arranged in a stack according to CFET-type configuration; a first layer of metallization (M_1st layer) over the stack which includes first conductors configured for data or control signals (communication (com) conductors), and power grid (PG) conductors; and a layer of metallization (M_B layer) below the stack and which includes second com conductors.