Fluid droplet methodology and apparatus for imprint lithography

A method can be used to generate a fluid droplet pattern for an imprint lithography process using a fluid dispense system having fluid dispense ports. The method can include determining a fluid droplet pattern for dispensing a formable material onto a substrate, during a first pass, dispensing the f...

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Bibliographische Detailangaben
Hauptverfasser:	Fletcher, Edward Brian, Simpson, Logan L, Irving, James W, Tavakkoli Kermani Ghariehali, Amir
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY COLOUR PRINTING ELECTROGRAPHY HOLOGRAPHY LINING MACHINES MATERIALS THEREFOR ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PRINTING PRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES STAMPS TRANSPORTING TYPEWRITERS
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Beschreibung
Zusammenfassung:	A method can be used to generate a fluid droplet pattern for an imprint lithography process using a fluid dispense system having fluid dispense ports. The method can include determining a fluid droplet pattern for dispensing a formable material onto a substrate, during a first pass, dispensing the formable material along a stitch line to form a first part of the fluid droplet pattern for an imprint field, where the stitch line runs from a first corner to a second corner of the imprint field. The method can also include offsetting the substrate and the fluid dispense ports relative to each other after dispensing the formable material during the first pass, and during a second pass, dispensing the formable material along the stitch line onto the substrate to form a second part of the fluid droplet pattern for the imprint field. An apparatus can be configured to carry out the method.