Fluorine detection in a gas discharge light source

An apparatus includes: a gas maintenance system having a gas supply system fluidly connected to one or more gas discharge chambers; a detection apparatus fluidly connected to each gas discharge chamber; and a control system connected to the gas maintenance system and the detection apparatus. The det...

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Bibliographische Detailangaben
Hauptverfasser: Thornes, Joshua Jon, Ahlawat, Rahul, Padmabandu, Gamaralalage G, Luo, Edward Siqi
Format: Patent
Sprache:eng
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Zusammenfassung:An apparatus includes: a gas maintenance system having a gas supply system fluidly connected to one or more gas discharge chambers; a detection apparatus fluidly connected to each gas discharge chamber; and a control system connected to the gas maintenance system and the detection apparatus. The detection apparatus includes: a vessel defining a reaction cavity that houses a metal oxide and is fluidly connected to the gas discharge chamber for receiving mixed gas including fluorine from the gas discharge chamber in the reaction cavity, the vessel enabling a reaction between the fluorine of the received mixed gas and the metal oxide to form a new gas mixture including oxygen; and an oxygen sensor fluidly connected to the new gas mixture to sense an amount of oxygen within the new gas mixture. The control system is configured to estimate a concentration of fluorine in the received mixed gas.