Laser apparatus and substrate etching method using the same

A laser apparatus may include a laser generator generating at least one a laser beam, which is used as an input light, an optical system converting the input light, which is provided from the laser generator, into a plurality of pattern lights, and a stage, on which a target object is loaded. The ou...

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Bibliographische Detailangaben
Hauptverfasser: Bae, Yoongyeong, Han, Gyoowan, Oh, Taekil, Ko, Yeonghwan, Ahn, Jooseob
Format: Patent
Sprache:eng
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Zusammenfassung:A laser apparatus may include a laser generator generating at least one a laser beam, which is used as an input light, an optical system converting the input light, which is provided from the laser generator, into a plurality of pattern lights, and a stage, on which a target object is loaded. The output light may be irradiated onto the target object. The optical system may divide the input light into a plurality of divided lights, and the pattern lights may be produced by constructive interference of the plurality of divided lights. A diameter of each of the pattern lights may be smaller than a diameter of the input light.