Method and apparatus for imaging using narrowed bandwidth

Systems, methods, and computer programs for increasing a contrast for a lithography system are disclosed. In one aspect, a method of optimizing a process for imaging a feature on a substrate using a photolithography system is disclosed, the method including obtaining an optical spectrum of a light b...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Hsu, Duan-Fu Stephen, Thornes, Joshua Jon, Conley, Willard Earl
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:Systems, methods, and computer programs for increasing a contrast for a lithography system are disclosed. In one aspect, a method of optimizing a process for imaging a feature on a substrate using a photolithography system is disclosed, the method including obtaining an optical spectrum of a light beam for the imaging, wherein the light beam includes pulses having a plurality of different wavelengths, and narrowing the optical spectrum of the pulses of the light beam for the imaging to improve a quality metric of the imaging.