Substrate processing system, liquid amount measuring method, computer-readable recording medium, and measuring jig
A substrate processing system includes: a measuring unit provided detachably with respect to a placement portion of a placement stage; a measuring jig for measuring a processing liquid; a liquid processing unit including a supplier which supplies the processing liquid to the measuring jig; a transfe...
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| creator | Ueyama, Shota Kunugimoto, Yuichiro Hatakeyama, Shinichi Teramoto, Akihiro Nishiyama, Yuta |
| description | A substrate processing system includes: a measuring unit provided detachably with respect to a placement portion of a placement stage; a measuring jig for measuring a processing liquid; a liquid processing unit including a supplier which supplies the processing liquid to the measuring jig; a transfer mechanism for transferring the measuring jig between the measuring unit and the liquid processing unit; and a controller. The controller executes: a process of transferring the measuring jig in the measuring unit from the measuring unit to the liquid processing unit; a process of ejecting the processing liquid from the supplier to the measuring jig; a third process of transferring the measuring jig from the liquid processing unit to the measuring unit; and a fourth process of calculating an ejection amount of the processing liquid based on a measurement value in the measuring unit. |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_US11726409B2</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>US11726409B2</sourcerecordid><originalsourceid>FETCH-epo_espacenet_US11726409B23</originalsourceid><addsrcrecordid>eNqNjL0SwUAURtMoDN7h6pMZCcNoGUYf6szN7k2syf64d7fw9hgKpeoU3_nOOOM6tRIZI0Fgr0jEuB7kIZFsDoO5J6MBrU8ugiWUxO_dUrx6nYPyNqRIXDChxnYgYFKe9cfRJr0a6PTP82b6aTbqcBCafTnJ5sfDeX8qKPiGJKAiR7G51GW5qdarxXZXLf9xnmc0RNY</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Substrate processing system, liquid amount measuring method, computer-readable recording medium, and measuring jig</title><source>esp@cenet</source><creator>Ueyama, Shota ; Kunugimoto, Yuichiro ; Hatakeyama, Shinichi ; Teramoto, Akihiro ; Nishiyama, Yuta</creator><creatorcontrib>Ueyama, Shota ; Kunugimoto, Yuichiro ; Hatakeyama, Shinichi ; Teramoto, Akihiro ; Nishiyama, Yuta</creatorcontrib><description>A substrate processing system includes: a measuring unit provided detachably with respect to a placement portion of a placement stage; a measuring jig for measuring a processing liquid; a liquid processing unit including a supplier which supplies the processing liquid to the measuring jig; a transfer mechanism for transferring the measuring jig between the measuring unit and the liquid processing unit; and a controller. The controller executes: a process of transferring the measuring jig in the measuring unit from the measuring unit to the liquid processing unit; a process of ejecting the processing liquid from the supplier to the measuring jig; a third process of transferring the measuring jig from the liquid processing unit to the measuring unit; and a fourth process of calculating an ejection amount of the processing liquid based on a measurement value in the measuring unit.</description><language>eng</language><subject>APPARATUS SPECIALLY ADAPTED THEREFOR ; CINEMATOGRAPHY ; CLEANING ; CLEANING IN GENERAL ; ELECTROGRAPHY ; HOLOGRAPHY ; MATERIALS THEREFOR ; MEASURING ; MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUIDLEVEL ; METERING BY VOLUME ; ORIGINALS THEREFOR ; PERFORMING OPERATIONS ; PHOTOGRAPHY ; PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES ; PHYSICS ; PREVENTION OF FOULING IN GENERAL ; TESTING ; TRANSPORTING ; WEIGHING</subject><creationdate>2023</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230815&DB=EPODOC&CC=US&NR=11726409B2$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,778,883,25547,76298</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20230815&DB=EPODOC&CC=US&NR=11726409B2$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Ueyama, Shota</creatorcontrib><creatorcontrib>Kunugimoto, Yuichiro</creatorcontrib><creatorcontrib>Hatakeyama, Shinichi</creatorcontrib><creatorcontrib>Teramoto, Akihiro</creatorcontrib><creatorcontrib>Nishiyama, Yuta</creatorcontrib><title>Substrate processing system, liquid amount measuring method, computer-readable recording medium, and measuring jig</title><description>A substrate processing system includes: a measuring unit provided detachably with respect to a placement portion of a placement stage; a measuring jig for measuring a processing liquid; a liquid processing unit including a supplier which supplies the processing liquid to the measuring jig; a transfer mechanism for transferring the measuring jig between the measuring unit and the liquid processing unit; and a controller. The controller executes: a process of transferring the measuring jig in the measuring unit from the measuring unit to the liquid processing unit; a process of ejecting the processing liquid from the supplier to the measuring jig; a third process of transferring the measuring jig from the liquid processing unit to the measuring unit; and a fourth process of calculating an ejection amount of the processing liquid based on a measurement value in the measuring unit.</description><subject>APPARATUS SPECIALLY ADAPTED THEREFOR</subject><subject>CINEMATOGRAPHY</subject><subject>CLEANING</subject><subject>CLEANING IN GENERAL</subject><subject>ELECTROGRAPHY</subject><subject>HOLOGRAPHY</subject><subject>MATERIALS THEREFOR</subject><subject>MEASURING</subject><subject>MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUIDLEVEL</subject><subject>METERING BY VOLUME</subject><subject>ORIGINALS THEREFOR</subject><subject>PERFORMING OPERATIONS</subject><subject>PHOTOGRAPHY</subject><subject>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</subject><subject>PHYSICS</subject><subject>PREVENTION OF FOULING IN GENERAL</subject><subject>TESTING</subject><subject>TRANSPORTING</subject><subject>WEIGHING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2023</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNqNjL0SwUAURtMoDN7h6pMZCcNoGUYf6szN7k2syf64d7fw9hgKpeoU3_nOOOM6tRIZI0Fgr0jEuB7kIZFsDoO5J6MBrU8ugiWUxO_dUrx6nYPyNqRIXDChxnYgYFKe9cfRJr0a6PTP82b6aTbqcBCafTnJ5sfDeX8qKPiGJKAiR7G51GW5qdarxXZXLf9xnmc0RNY</recordid><startdate>20230815</startdate><enddate>20230815</enddate><creator>Ueyama, Shota</creator><creator>Kunugimoto, Yuichiro</creator><creator>Hatakeyama, Shinichi</creator><creator>Teramoto, Akihiro</creator><creator>Nishiyama, Yuta</creator><scope>EVB</scope></search><sort><creationdate>20230815</creationdate><title>Substrate processing system, liquid amount measuring method, computer-readable recording medium, and measuring jig</title><author>Ueyama, Shota ; Kunugimoto, Yuichiro ; Hatakeyama, Shinichi ; Teramoto, Akihiro ; Nishiyama, Yuta</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_US11726409B23</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2023</creationdate><topic>APPARATUS SPECIALLY ADAPTED THEREFOR</topic><topic>CINEMATOGRAPHY</topic><topic>CLEANING</topic><topic>CLEANING IN GENERAL</topic><topic>ELECTROGRAPHY</topic><topic>HOLOGRAPHY</topic><topic>MATERIALS THEREFOR</topic><topic>MEASURING</topic><topic>MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUIDLEVEL</topic><topic>METERING BY VOLUME</topic><topic>ORIGINALS THEREFOR</topic><topic>PERFORMING OPERATIONS</topic><topic>PHOTOGRAPHY</topic><topic>PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES</topic><topic>PHYSICS</topic><topic>PREVENTION OF FOULING IN GENERAL</topic><topic>TESTING</topic><topic>TRANSPORTING</topic><topic>WEIGHING</topic><toplevel>online_resources</toplevel><creatorcontrib>Ueyama, Shota</creatorcontrib><creatorcontrib>Kunugimoto, Yuichiro</creatorcontrib><creatorcontrib>Hatakeyama, Shinichi</creatorcontrib><creatorcontrib>Teramoto, Akihiro</creatorcontrib><creatorcontrib>Nishiyama, Yuta</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Ueyama, Shota</au><au>Kunugimoto, Yuichiro</au><au>Hatakeyama, Shinichi</au><au>Teramoto, Akihiro</au><au>Nishiyama, Yuta</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Substrate processing system, liquid amount measuring method, computer-readable recording medium, and measuring jig</title><date>2023-08-15</date><risdate>2023</risdate><abstract>A substrate processing system includes: a measuring unit provided detachably with respect to a placement portion of a placement stage; a measuring jig for measuring a processing liquid; a liquid processing unit including a supplier which supplies the processing liquid to the measuring jig; a transfer mechanism for transferring the measuring jig between the measuring unit and the liquid processing unit; and a controller. The controller executes: a process of transferring the measuring jig in the measuring unit from the measuring unit to the liquid processing unit; a process of ejecting the processing liquid from the supplier to the measuring jig; a third process of transferring the measuring jig from the liquid processing unit to the measuring unit; and a fourth process of calculating an ejection amount of the processing liquid based on a measurement value in the measuring unit.</abstract><oa>free_for_read</oa></addata></record> |
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| subjects | APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY CLEANING CLEANING IN GENERAL ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR MEASURING MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUIDLEVEL METERING BY VOLUME ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS PREVENTION OF FOULING IN GENERAL TESTING TRANSPORTING WEIGHING |
| title | Substrate processing system, liquid amount measuring method, computer-readable recording medium, and measuring jig |
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