Apparatus for removing photoresist off of photomask

Embodiments of a photomask removal apparatus for removing photoresist off of a photomask are provided herein. In some embodiments, a nozzle head for removing photoresist off of a photomask includes: a nozzle portion having a first side and an opposing second side and a flow path extending from the f...

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Bibliographische Detailangaben
1. Verfasser:	Phillips, Tyler Joe
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	Embodiments of a photomask removal apparatus for removing photoresist off of a photomask are provided herein. In some embodiments, a nozzle head for removing photoresist off of a photomask includes: a nozzle portion having a first side and an opposing second side and a flow path extending from the first side to the second side, wherein the flow path includes an orifice disposed between the first side and the second side and a nozzle that extends from the orifice to a nozzle exit on the second side, and wherein the flow path in the nozzle increases in width at an angle from the orifice to the second side; and a vacuum portion coupled to the nozzle portion, wherein the vacuum portion includes a first side and an opposing second side that faces the nozzle exit, wherein the vacuum portion includes a vacuum port extending from the second side.