High-purity 1,1,1,2,3,3-hexafluoropropane, method for producing same and use thereof

The present invention relates to a method for producing high-purity 1,1,1,2,3,3-hexafluoropropane and a composition containing mainly 1,1,1,2,3,3-hexafluoropropane, suitable for use as a cleaning agent in the semiconductor industry.

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Bibliographische Detailangaben
Hauptverfasser: Deur-Bert, Dominique, Wendlinger, Laurent
Format: Patent
Sprache:eng
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Zusammenfassung:The present invention relates to a method for producing high-purity 1,1,1,2,3,3-hexafluoropropane and a composition containing mainly 1,1,1,2,3,3-hexafluoropropane, suitable for use as a cleaning agent in the semiconductor industry.