Target supply device, extreme ultraviolet light generation apparatus, and electronic device manufacturing method

A target supply device may include a tank configured to store a target substance, a pressure adjuster configured to adjust a pressure in the tank, a filter configured to filter the target substance in the tank, a nozzle configured to output a droplet of the target substance having passed through the...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: Yamasaki, Koji, Iwamoto, Fumio
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:A target supply device may include a tank configured to store a target substance, a pressure adjuster configured to adjust a pressure in the tank, a filter configured to filter the target substance in the tank, a nozzle configured to output a droplet of the target substance having passed through the filter, a droplet detector configured to detect outputting of the droplet from the nozzle, and a processor configured to control the pressure adjuster so that a pressure-increasing speed of the pressure in the tank is higher after detection of outputting of the droplet than before detection of outputting of the droplet, during a period in which the pressure in the tank is increased to a target pressure from a pressure at which outputting of the droplet is detected by the droplet detector for the first time after installation of the target supply device.