Passivation for a semiconductor light emitting device

In embodiments of the invention, a passivation layer is disposed over a side of a semiconductor structure including a light emitting layer disposed between an n-type region and a p-type region. A material configured to adhere to an underfill is disposed over an etched surface of the semiconductor st...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: Choy, Kwong-Hin Henry, Rudaz, Serge L, Wei, Frank L, Diana, Frederic Stephane, Steigerwald, Daniel A, Mo, Qingwei
Format: Patent
Sprache:eng
Schlagworte:
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Beschreibung
Zusammenfassung:In embodiments of the invention, a passivation layer is disposed over a side of a semiconductor structure including a light emitting layer disposed between an n-type region and a p-type region. A material configured to adhere to an underfill is disposed over an etched surface of the semiconductor structure.